Multilayer film deposition ion beam sputtering device for optical filters
It is an ion beam sputtering device for DWDM film deposition.
This is an ion beam sputtering device for the optical field. Sputter: 16cm RF Ion Source Assist: 16cm RF Ion Source Target: 2 surfaces, oscillation function Stage: rotation Film thickness control: transmission-type wavelength-variable laser film thickness control Main exhaust: cryopump or TMP + SUPCOLD For more details, please contact us.
- Company：アールエムテック
- Price：Other
